X-Ray Photoelectron Spectroscopy (XPS) with Auger

XPS and AES Spectrometer (Physical Electronics VersaProbe 5000)

Contact: Dmitri Barbash

 

Important Features

  • Combines a unique monochromatic X-ray probe with automated sample handling and analysis area identification tools to give true chemical state imaging and multi-point spectroscopy in an automated environment
  • Designed for rapid, spatially resolved elemental and chemical analysis of solid surfaces
  • Provides elemental information for all elements except H and He based on the binding energy of core electrons in atoms through x-ray photoelectron spectra
  • Intrinsically surface specific technique, signal is obtained from the top 10 nm of the sample
  • Provides information for chemical bonding in specific molecular configurations (chemical shift)
  • Micro-focused monochromatic scanned X-ray beam, Al anode (E = 1486 eV), 10 to 100 micron diameter beam spot
  • Automated multiple point analysis with customer defined spot sizes from 10 um to 200 um
  • Large area analysis by rastering the X-ray beam with 100 W power over a 1400 um x 100 um area on the sample
  • X-ray induced secondary electron imaging provides SEM functionality for selection of analysis regions over a total area of 1400 x 1400 microns
  • A microscope, camera and a white light source for real time light imaging during sample positioning
  • A 180° hemispherical electron energy analyzer optimized for energy resolution and high angular acceptance lens optimized for
    small area XPS sensitivity. Energy resolution <0.5 eV (Ag 3d 5/2 peak)
  • A unique, 16-channel detector and fast electronics for rapid data acquisition and maximum sensitivity in both the scanned and unscanned data acquisition modes
  • True Ultra-High Vacuum (UHV) analytical chamber to prevent sample contamination and to provide unambiguous elemental and chemical
    characterization of surface features  
  • 240 l/s differential ion pump and a 1,000 l/s Titanium Sublimation Pump (TSP) pump the UHV chamber down to ca 10-7 Pa 
  • Unique and patented dual beam charge compensation system that utilizes both a cool cathode electron flood source and very low energy Ar ion beam to provide turnkey charge neutralization of all sample types. Capable of analyzing electrically insulating samples with no special sample preparation
  • Fully automated, five-axis (X, Y, Z, rotation and tilt), precision, eucentric specimen stage that uses the computer to locate the selected analysis positions
  • Angle-resolved depth profiling up to 10 nm by sample stage rotation 
  • High performance XPS and Auger sputter depth profiling by Ar ion gun for inorganic samples and by C60 ion gun for organic samples. Sputter rates form 0.1 nm/min to several tens nm/min depending on sample material
  • Hot/cold sample stage : Heating to 500 C, Cooling to -100 C. 
  • Scanning Auger Electron Spectroscopy (AES) option: < 100 nm electron beam diameter; Beam voltage: 0.2 ~ 10 kV; Energy Resolution: <0.15%
    Mu metal shield of UHV analysis chamber for most accurate results 
  • Multiple element mapping/imaging of a selected area in XPS and AES modes can be done with high precision and resolution limited by the size of the x-ray beam/Auger electron beam. 

 

Drexel University Copyright © 2010, Drexel University, 3141 Chestnut Street, Philadelphia, PA 19104, 215-895-2000, All Rights Reserved.